For research use only. Not for therapeutic Use.
Aripiprazole (1,1,2,2,3,3,4,4-d8) (CAS: 1089115-04-7), a premium pharmaceutical research compound designed for advanced psychopharmacological studies. As a deuterated analog of Aripiprazole, it offers enhanced stability and improved pharmacokinetic properties. Aripiprazole (1,1,2,2,3,3,4,4-d8) is ideal for use in pharmacological and biochemical research, providing precise and reliable data for your studies. This high-purity compound ensures consistent results, aiding in the development of novel antipsychotic therapies. Trusted by leading laboratories, Aripiprazole (1,1,2,2,3,3,4,4-d8) is your go-to solution for cutting-edge mental health research. Unlock new possibilities in the treatment of psychiatric disorders with Aripiprazole (1,1,2,2,3,3,4,4-d8), where innovation meets reliability.
Catalog Number | S000253 |
CAS Number | 1089115-04-7 |
Molecular Formula | C23H19D8Cl2N3O2 |
Purity | ≥95% |
IUPAC Name | 7-[1,1,2,2,3,3,4,4-octadeuterio-4-[4-(2,3-dichlorophenyl)piperazin-1-yl]butoxy]-3,4-dihydro-1H-quinolin-2-one |
InChI | InChI=1S/C23H27Cl2N3O2/c24-19-4-3-5-21(23(19)25)28-13-11-27(12-14-28)10-1-2-15-30-18-8-6-17-7-9-22(29)26-20(17)16-18/h3-6,8,16H,1-2,7,9-15H2,(H,26,29)/i1D2,2D2,10D2,15D2 |
InChIKey | CEUORZQYGODEFX-BQLKVSHCSA-N |
SMILES | [2H]C([2H])(C([2H])([2H])C([2H])([2H])OC1=CC2=C(CCC(=O)N2)C=C1)C([2H])([2H])N3CCN(CC3)C4=C(C(=CC=C4)Cl)Cl |
Reference | [1]. Russak EM, et al. Impact of Deuterium Substitution on the Pharmacokinetics of Pharmaceuticals. Ann Pharmacother. 2019;53(2):211-216. [2]. Stip E, Tourjman V. et al. Aripiprazole in schizophrenia and schizoaffective disorder: A review. Clin Ther. 2010;32 Suppl 1:S3-20. [3]. Burris KD, Molski TF, Xu C et al. Aripiprazole, a novel antipsychotic, is a high-affinity partial agonist at human dopamine D2 receptors. J Pharmacol Exp Ther. 2002 Jul;302(1):381-9. [4]. Swainston Harrison T, Perry CM. Aripiprazole: a review of its use in schizophrenia and schizoaffective disorder. Drugs. 2004;64(15):1715-36. [5]. Nagasaka Y, Oda K, Iwatsubo T, Kawamura A, Usui T. |