For research use only. Not for therapeutic Use.
Di(t-butylamino)silane (Cat.No:M034852) is a chemical compound utilized in various industrial processes, primarily in the semiconductor industry. It serves as a precursor for the deposition of silicon-containing thin films, particularly silicon nitride and silicon oxide, using chemical vapor deposition (CVD) techniques. This compound contributes to advanced materials and electronics manufacturing.
Catalog Number | M034852 |
CAS Number | 186598-40-3 |
Molecular Formula | C8H20N2Si |
Purity | ≥95% |
Storage | -20°C |
IUPAC Name | bis(tert-butylamino)silicon |
InChI | InChI=1S/C8H20N2Si/c1-7(2,3)9-11-10-8(4,5)6/h9-10H,1-6H3 |
InChIKey | PHUNDLUSWHZQPF-UHFFFAOYSA-N |
SMILES | CC(C)(C)N[Si]NC(C)(C)C |